首页> 外国专利> Being the antireflection film which is laminated on the acid resisting null transparent backing material it can making use of the antireflection film and the replica membrane which can production method of the antireflection film and the antireflection film, making use of the mold

Being the antireflection film which is laminated on the acid resisting null transparent backing material it can making use of the antireflection film and the replica membrane which can production method of the antireflection film and the antireflection film, making use of the mold

机译:作为层叠在耐酸的无效透明背衬材料上的防反射膜,可以利用模具来利用防反射膜和复制膜来制造防反射膜和防反射膜的方法。

摘要

PPROBLEM TO BE SOLVED: To provide an antireflection film that has satisfactory antireflection performance to light in the visible range of wavelengths without coloring under the radiation of light in the visible range of wavelengths, and can be manufactured by a simple method. PSOLUTION: The antireflection film is laminated on a transparent substrate. The antireflection film includes a transparent resin and microparticles dispersed in the transparent resin. The microparticles have an average center distance in the range of 50 to 800 nm between nearest neighbor particles. The microparticles in the antireflection film have an amorphous structure of array. The surface of the antireflection film is shaped into recesses and projections having an average projection height in the range of 40 to 500 nm. PCOPYRIGHT: (C)2009,JPO&INPIT
机译:

要解决的问题:提供一种抗反射膜,其对可见光波长范围内的光具有令人满意的抗反射性能,而在可见光波长范围内的光辐射下不会变色,并且可以通过简单的方法制造。

解决方案:防反射膜层压在透明基板上。防反射膜包括透明树脂和分散在透明树脂中的微粒。微粒之间最近的相邻微粒之间的平均中心距离为50到800 nm。抗反射膜中的微粒具有无定形的阵列结构。抗反射膜的表面被成形为具有平均凸起高度在40至500nm范围内的凹陷和凸起。

版权:(C)2009,日本特许厅&INPIT

著录项

  • 公开/公告号JP5187495B2

    专利类型

  • 公开/公告日2013-04-24

    原文格式PDF

  • 申请/专利权人 株式会社豊田中央研究所;

    申请/专利号JP20070318076

  • 发明设计人 石井 昌彦;中村 浩;

    申请日2007-12-10

  • 分类号G02B1/11;B32B7/02;B29C33/38;B29C41/38;B29C39/26;C01B33/12;B29K83;B29L11;

  • 国家 JP

  • 入库时间 2022-08-21 16:54:59

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