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Board positioning method, substrate position detection method, substrate position deviation correction device substrate and method of recovery

机译:基板定位方法,基板位置检测方法,基板位置偏差校正装置基板和恢复方法

摘要

PROBLEM TO BE SOLVED: To provide a substrate positioning method, a substrate position detecting method and a substrate collecting method for detecting a position of the substrate, positioning the substrate, and collecting the substrate without any damage on the substrate not only in the case where the circumferential edge of the substrate can be detected but also the substrate is displaced as much as disabling detection of the circumferential edge of the substrate.;SOLUTION: The circumferential edges of wafer as the objects are respectively detected (step S210) on the basis of output images from a plurality of imaging means arranged along the shape of the circumferential edge of the wafer and correction (step S220) of displacement of the wafer and rough correction thereof (step S230) are conducted in accordance with the number of imaging means having detected the circumferential edges of wafer. If the circumferential edge of wafer cannot be detected with all imaging means, wafer position adjustment (step S240) is conducted by moving the wafer in the position adjusting direction attained by combination of output images obtained from each imaging means.;COPYRIGHT: (C)2008,JPO&INPIT
机译:解决的问题:提供一种基板定位方法,基板位置检测方法和基板收集方法,用于检测基板的位置,定位基板并收集基板而不仅在基板上没有任何损坏的情况下,既可以检测到衬底的周向边缘,又可以使衬底移位到与不能检测到衬底的周向边缘相同的程度;解决方案:根据以下步骤分别检测作为对象的晶片的周向边缘(步骤S210):根据已检测的成像装置的数量,进行从沿着晶片的周缘的形状布置的多个成像装置的输出图像以及晶片的位移的校正(步骤S220)及其粗略校正(步骤S230)。晶片的圆周边缘。如果不能用所有的成像装置检测到晶片的圆周边缘,则通过沿晶片的位置调整方向移动晶片来进行晶片位置调整(步骤S240),该位置调整方向是结合从每个成像装置获得的输出图像而获得的。 2008,日本特许厅

著录项

  • 公开/公告号JP5132904B2

    专利类型

  • 公开/公告日2013-01-30

    原文格式PDF

  • 申请/专利权人 東京エレクトロン株式会社;

    申请/专利号JP20060240037

  • 发明设计人 新藤 健弘;

    申请日2006-09-05

  • 分类号H01L21/68;H01L21/67;

  • 国家 JP

  • 入库时间 2022-08-21 16:54:05

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