Method for fabricating a structure comprising at least one thin layer of amorphous material obtained on a support substrate by epitaxy, and the structure obtained by the method

摘要

Way with respect to the surface of step and the aforementioned intermediate structure which form the intermediate structure which has the 1st crystalline layer to which this invention, being the method of producing the structure which at least has the thin layer of 1 layer on the support baseplate, being generally known intermediate structure, amorphous layer, includes point defect, is directly under the aforementioned amorphous layer, and the 2nd crystalline layer which is inside lower part of intermediate structure, from the aforementioned support baseplate, layer of the intermediate structure which step and the point defect which connect the receipt baseplate occur, amorphous layer becomes higher stratum of society of intermediate structure,It regards the method of including with the step which it removes at least. Being the baseplate which as for another purpose of this invention, is on the support baseplate, has at least the thin layer of 1 layer of the amorphous materials, the receipt baseplate, it has central crystalline layer, and amorphous layer, the aforementioned receipt baseplate, in crystalline layer, and amorphous layer, it regards the baseplate which is not point defect of any EOR type.