By applying a voltage to a substrate is placed in a solution that is suspended mesoporous silica and mesoporous silica thick, is characterized in that the layer according to mesoporous silica is formed to a thickness of 10μm~1mm, the substrate surface method for producing a thick mesoporous silica, which is characterized by forming a film having a thickness of 10μm~1mm by electrodeposition are run mesoporous silica.
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