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METHOD AND SYSTEM FOR DEFECT-BITMAP-FAIL PATTERNS MATCHING ANALYSIS INCLUDING PERIPHERAL DEFECTS

机译:包含周边缺陷的缺陷位图失败模式匹配分析的方法和系统

摘要

A system and method for fail pattern analysis for a memory device is disclosed. The peripheral circuits of a memory device are divided into different zones based on circuit design and layout. Defects are detected by inline inspection of multiple SRAM devices at various stages in the manufacturing process and saved into a database. When the devices are fabricated, electrical tests are then performed. Electrical failure patterns are also recorded and saved in the database. A correlation between the zone in which a visual defect resides and an electrical failure is recorded in computer storage. Visual defects found during inline inspection are then associated with an electrical failure in the memory device.
机译:公开了一种用于存储设备的故障模式分析的系统和方法。根据电路设计和布局,存储设备的外围电路分为不同的区域。在制造过程的各个阶段,通过对多个SRAM器件进行内联检查来检测缺陷,并将其保存到数据库中。在制造设备时,然后执行电气测试。电气故障模式也被记录并保存在数据库中。视觉缺陷所在区域与电气故障之间的相关性被记录在计算机存储中。在内联检查期间发现的视觉缺陷随后与存储设备中的电气故障相关联。

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