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OPTICAL ELEMENT, LITHOGRAPHIC APPARATUS INCLUDING SUCH OPTICAL ELEMENT AND DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED THEREBY
OPTICAL ELEMENT, LITHOGRAPHIC APPARATUS INCLUDING SUCH OPTICAL ELEMENT AND DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED THEREBY
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机译:光学元件,包括这种光学元件的光刻设备和器件制造方法,以及由此制造的器件
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摘要
An optical element includes a top layer which is transmissive for EUV radiation with wavelength in the range of 5-20 nm, and a structure of the top layer is a structure having an rms roughness value equal to or larger than λ/10 for spatial periods equal to or smaller than λ/2. The structure promotes transmission through the top layer to the optical element.
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