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Illumination system for a microlithography projection exposure apparatus, microlithography projection exposure apparatus comprising such an illumination system, and fourier optical system
Illumination system for a microlithography projection exposure apparatus, microlithography projection exposure apparatus comprising such an illumination system, and fourier optical system
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机译:用于微光刻投影曝光设备的照明系统,包括这种照明系统的微光刻投影曝光设备和傅立叶光学系统
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摘要
An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field with the light from a primary light source has a variably adjustable pupil shaping unit for receiving light from the primary light source and for generating a variably adjustable two-dimensional intensity distribution in a pupil shaping surface of the illumination system. The pupil shaping unit has a Fourier optical system for converting an entrance beam bundle entering through an entrance plane of the Fourier optical system into an exit beam bundle exiting from an exit plane of the Fourier optical system. The Fourier optical system has a focal length fFOS and a structural length L measured between an entrance-side first system surface and an exit-side last system surface along an optical axis, where (L/fFOS)1/6.
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机译:用于用来自主光源的光照射照明场的微光刻投影曝光设备的照明系统具有可变可调的光瞳整形单元,该光瞳整形单元用于接收来自初级光源的光并用于在光源中产生可变可调的二维强度分布。照明系统的瞳孔整形表面。光瞳整形单元具有傅立叶光学系统,用于将通过傅立叶光学系统的入射平面入射的入射光束转换为从傅立叶光学系统的出射平面出射的出射光束。傅里叶光学系统的焦距f FOS Sub>和结构长度L沿光轴在入射侧第一个系统表面和出射侧最后一个系统表面之间测量,其中(L / f < Sub> FOS Sub>)<1/6。
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