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Method for manufacturing 3-dimensional structures using thin film with columnar nano pores and manufacture thereof

机译:使用具有柱状纳米孔的薄膜制造三维结构的方法及其制造

摘要

Disclosed is a method for manufacturing 3-dimensional structure using a thin film with a columnar nano pores and a manufacture thereof. A method for packaging an MEMS device or an NEMS device in accordance with an embodiment of the present invention includes: forming a sacrificial layer; forming a thin film having columnar nano pores formed therein by depositing one of a metallic material, an oxide, a nitride and a fluoride on the sacrificial layer; forming a support layer on the thin film and patterning the support layer; removing the sacrificial layer through use of the nano pores of the thin film parts of which are exposed by patterning the support layer; and forming a shielding layer on the thin film and the support layer.
机译:公开了一种使用具有圆柱状纳米孔的薄膜制造三维结构的方法及其制造。根据本发明的实施例的用于封装MEMS装置或NEMS装置的方法包括:形成牺牲层;以及形成牺牲层。通过在牺牲层上沉积金属材料,氧化物,氮化物和氟化物中的一种来形成其中形成有柱状纳米孔的薄膜;在薄膜上形成支撑层并对支撑层进行构图;通过使用通过将支撑层图案化而暴露的薄膜部分的纳米孔来去除牺牲层;在所述薄膜和所述支撑层上形成屏蔽层。

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