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Conductivity control of water content in solvent strip baths

机译:电导率控制溶出液中的水含量

摘要

A system and method for control of water content in a strip bath. The method to control water content in a solvent bath used for cleaning of semiconductor parts in the back end of semiconductor manufacturing requires addition of water to replace evaporated water. This is done by periodically adjusting a conductivity setpoint at least in part based on the elapsed chemical bathlife and at least in part based on the number of semiconductor parts that have been processed in the bath. The conductivity of the strip bath solution is then continuously measured (as by using an electrodeless conductivity probe). Water is added (as by a DI water injection system) into the bath solution whenever the solvent conductivity falls below the conductivity set point.
机译:一种用于控制带钢浴中水含量的系统和方法。控制在半导体制造的后端中用于清洁半导体部件的溶剂浴中的水含量的方法需要添加水来代替蒸发的水。这通过至少部分地基于所经过的化学浴寿命并且至少部分地基于浴中已经处理的半导体部件的数量来周期性地调节电导率设定点来完成。然后连续测量剥离浴溶液的电导率(如使用无电极电导率探针)。每当溶剂电导率降至电导率设定点以下时,就将水(通过DI注水系统)添加到浴液中。

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