首页> 外国专利> Pharmaceutical dosage form with resistance to Breaking of at least 500 N, which contains an active ingredient, an Anionic polysaccharide and a polyalkylene oxide.Where the active ingredient is present in a Matrix controlled release comprising Anionic polysaccharide and polyalkylene oxide.

Pharmaceutical dosage form with resistance to Breaking of at least 500 N, which contains an active ingredient, an Anionic polysaccharide and a polyalkylene oxide.Where the active ingredient is present in a Matrix controlled release comprising Anionic polysaccharide and polyalkylene oxide.

机译:具有至少500N的抗断裂性的药物剂型,其包含活性成分,阴离子多糖和聚环氧烷。其中活性成分以包含阴离子多糖和聚环氧烷的基质控释存在。

摘要

Pharmaceutical dosage form with resistance to Breaking of at least 500 N, which contains an active ingredient, an Anionic polysaccharide and a polyalkylene oxide.Where the active ingredient is present in a Matrix controlled release and the Anionic polysaccharide comprising polyalkylene oxide.
机译:具有至少500N的抗断裂性的药物剂型,其包含活性成分,阴离子多糖和聚环氧烷。其中活性成分以基质控释和包含聚环氧烷的阴离子多糖存在。

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