PHOTO PAINT

摘要

The invention relates to a resist, in particular for the preparation of a patternable by irradiation coating comprising a) a copolymer of at least a first 2-oxazoline derivative of the formula I (I) with at least a second 2-oxazoline derivative of formula II (II) wherein R1 and R2 are each aliphatic and / or aromatic radicals represent, wherein the radical R2 has a functional group cross-linkable by irradiation, b) a photoinitiator, c) a crosslinker which upon irradiation reacts with the functional group; d) optional a stabilizer; e) optionally a surfactant; f) at least one solvent.A such photoresist is suitable for producing a good adherent coating in particular printed circuit board substrates, as a result, patterning a coating created with high resolution is possible. Furthermore, the invention relates to a method for producing a structured by photochemical crosslinking a coating on a substrate, a thus obtainable coating and a printed tensubstrat with such a coating.