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A DEVICE FOR LOADING POROUS SUBSTRATES OF THREE-DIMENSIONAL SHAPE IN ORDER TO BE DENSIFIED BY DIRECTED FLOW CHEMICAL VAPOR INFILTRATION
A DEVICE FOR LOADING POROUS SUBSTRATES OF THREE-DIMENSIONAL SHAPE IN ORDER TO BE DENSIFIED BY DIRECTED FLOW CHEMICAL VAPOR INFILTRATION
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机译:定向流动的化学气相渗透致密化三维维多孔基体的加载装置
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摘要
Loading device (10) for densification via chemical infiltration in steam phase in directed flow, in a reaction chamber of an infiltration oven, of three-dimensional porous substrates (20) extending primarily in a longitudinal direction, said device comprising an annular loading level (11) formed by first and second annular vertical units (110, 111) distributed concentrically in relation to one another and delimiting between one another an annular loading area (13) for the porous substrates to be densified. First and second plates (112, 113) respectively cover the lower element and the upper element of the annular loading area (13). The first and second annular vertical units (110, 111) each comprise supporting members (1100, 1110) distributed in the annular loading area (13) in such a manner as to define between them unit loading cells (14), each unit loading cell being intended for receiving a substrate to be densified. The device additionally comprises gas supply orifices (1102) and gas evacuation orifices (1112) in the vicinity of each unit loading cell (14).
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