首页> 外国专利> A DEVICE FOR LOADING POROUS SUBSTRATES OF THREE-DIMENSIONAL SHAPE IN ORDER TO BE DENSIFIED BY DIRECTED FLOW CHEMICAL VAPOR INFILTRATION

A DEVICE FOR LOADING POROUS SUBSTRATES OF THREE-DIMENSIONAL SHAPE IN ORDER TO BE DENSIFIED BY DIRECTED FLOW CHEMICAL VAPOR INFILTRATION

机译:定向流动的化学气相渗透致密化三维维多孔基体的加载装置

摘要

Loading device (10) for densification via chemical infiltration in steam phase in directed flow, in a reaction chamber of an infiltration oven, of three-dimensional porous substrates (20) extending primarily in a longitudinal direction, said device comprising an annular loading level (11) formed by first and second annular vertical units (110, 111) distributed concentrically in relation to one another and delimiting between one another an annular loading area (13) for the porous substrates to be densified. First and second plates (112, 113) respectively cover the lower element and the upper element of the annular loading area (13). The first and second annular vertical units (110, 111) each comprise supporting members (1100, 1110) distributed in the annular loading area (13) in such a manner as to define between them unit loading cells (14), each unit loading cell being intended for receiving a substrate to be densified. The device additionally comprises gas supply orifices (1102) and gas evacuation orifices (1112) in the vicinity of each unit loading cell (14).
机译:用于在渗透炉的反应室中以定向流通过蒸汽相中的化学渗透致密化的加载装置(10),该渗透装置主要在纵向方向上延伸三维三维基质(20),所述装置包括环形加载水平(由第一和第二环形竖直单元(110、111)形成的第一环形竖直单元(110、111)彼此同心地分布,并且在彼此之间限定用于致密的多孔基板的环形加载区域(13)。第一和第二板(112、113)分别覆盖环形装载区域(13)的下部元件和上部元件。第一环形垂直单元和第二环形垂直单元(110、111)分别包括支撑构件(1100、1110),该支撑构件以在环形加载区域(13)中限定单元加载单元(14),每个单元加载单元的方式分布在环形加载区域(13)中。用于接收要致密的基材。该装置还包括在每个单元负载单元(14)附近的气体供应孔(1102)和排气孔(1112)。

著录项

  • 公开/公告号CA2849876A1

    专利类型

  • 公开/公告日2013-04-04

    原文格式PDF

  • 申请/专利权人 HERAKLES;

    申请/专利号CA20122849876

  • 申请日2012-09-14

  • 分类号C23C16/04;

  • 国家 CA

  • 入库时间 2022-08-21 16:37:47

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