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HIGH PEAK POWER PLASMA PULSED SUPPLY WITH ARC HANDLING
HIGH PEAK POWER PLASMA PULSED SUPPLY WITH ARC HANDLING
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机译:具有电弧处理功能的大功率等离子脉冲电源
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摘要
There is provided by this invention novel magnetron sputtering apparatus that is generally comprised of a pulsed do power supply capable of delivering peak powers of 0.1 megaWatts to several megaWatts with a peak power density greater than 1 kW/cm2. The power supply has a pulsing circuit comprised of an energy storage capacitor and serially connected inductor with a switching means for disconnecting the pulsing circuit from the plasma and recycling the inductor energy back to the energy storage capacitor at the detection of an arc condition. The energy storage capacitor and the serially connected inductor provide an impedance match to the plasma, limits the current rate of rise and peak magnitude in the event of an arc, and shapes the voltage pulses to the plasma.
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机译:本发明提供了一种新颖的磁控溅射设备,该设备通常包括能够将峰值功率密度大于1kW / cm 2的0.1兆瓦至几兆瓦的峰值功率输送的脉冲do电源。电源具有由储能电容器和串联连接的电感器组成的脉冲电路,该开关电路具有开关装置,用于在检测电弧情况时将脉冲电路与等离子体断开并将电感器能量循环回储能电容器。储能电容器和串联连接的电感器提供与等离子体的阻抗匹配,在发生电弧的情况下限制电流的上升速率和峰值幅度,并对等离子体施加电压脉冲。
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