首页> 外国专利> HIGH FREQUENCY COIL DRAWING HOLE STRUCTURE CAPABLE OF PRODUCING 5 TO 10 SILICON CORES SIMULTANEOUSLY

HIGH FREQUENCY COIL DRAWING HOLE STRUCTURE CAPABLE OF PRODUCING 5 TO 10 SILICON CORES SIMULTANEOUSLY

机译:高频线圈拉孔结构,可同时生产5到10个硅芯

摘要

A high frequency coil drawing 5 to 10 silicon cores simultaneously. A drawing hole or material melting hole (11) is disposed in a middle portion of a round high frequency coil (2). 4 to 9 drawing holes (5) surrounding the outside of the hole evenly are disposed. Flow guide grooves (12) are disposed radially between the drawing hole or material melting hole (11) and any two drawing holes (5). An outer end head (4) of the flow guide groove (12) is disposed between any two drawing holes. A drainage groove (6) or a V-shaped notch (16) is disposed on one side, facing the drawing hole or material melting hole (11), of the drawing hole (5). A distance is kept between a pointed end of the drainage groove (6) or the V-shaped notch (16) and the drawing hole or material melting hole (11). Outer ends of a water inlet pipeline (8) and a water outlet pipeline (13) are each provided with a connecting seat (9). The drainage groove or the V-shaped notch enables a drawing hole current surrounding the periphery to be distributed around the drawing hole evenly, thereby effectively decreasing the ovality of an obtained columnar crystal.
机译:高频线圈同时吸引5到10个硅芯。在圆形高频线圈(2)的中部设置有引出孔或材料熔化孔(11)。在该孔的外侧均匀地配置有图4〜图9所示的拉孔(5)。导流槽(12)沿径向设置在引出孔或材料熔化孔(11)与任意两个引出孔(5)之间。导流槽(12)的外端头(4)设置在任意两个拉孔之间。在引出孔(5)的与引出孔或材料熔化孔(11)相对的一侧设置有排水槽(6)或V字状的缺口(16)。排水槽(6)的尖端或V形槽口(16)与拉孔或材料熔化孔(11)之间保持一定距离。进水管线(8)和出水管线(13)的外端均设有连接座(9)。排水槽或V形槽口使得围绕周边的拉孔电流能够均匀地分布在拉孔周围,从而有效地降低了获得的柱状晶体的椭圆度。

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