首页> 外国专利> P-TYPE CONDUCTIVE SB DOPED SNO2 THIN FILM, TIN OXIDE HOMOGENOUS PN JUNCTION CONTAINING SAME, AND METHODS FOR PREPARATION THEREOF

P-TYPE CONDUCTIVE SB DOPED SNO2 THIN FILM, TIN OXIDE HOMOGENOUS PN JUNCTION CONTAINING SAME, AND METHODS FOR PREPARATION THEREOF

机译:P型导电SB掺杂的SNO 2 薄膜,氧化锡均质PN结包含相同的薄膜及其制备方法

摘要

Provided are a p-type conductive Sb doped SnO2 thin film, a tin oxide homogenous pn junction containing same, and methods for preparation thereof. A method for preparing a p-type Sb doped SnO2 thin film comprises using Sb doped SnO2 ceramic target material and using a magnetron sputtering method to carry out the preparation on a single crystal Si or a quartz glass; and the tin oxide homogenous pn junction is obtained by sputtering and depositing a n-type Sb doped SnO2 thin film onto the p-type Sb doped SnO2 thin film. The p-type conductive Sb doped SnO2 thin film has a stable electrical conductive performance, a high hole concentration, hole mobility and conductivity, having a hole concentration of up to an order of magnitude of 1020cm-3, a conductivity of up to 60S∙cm-1 and at the same time a hole mobility of up to 2-30cm2∙V-1∙s-1, and a high transparency for visible light. The method for preparation thereof has simple processes, has good reproducibility, and is easy to use industrially. The prepared homogenous tin oxide-based transparent pn junction has the current-voltage profile characteristics of a semiconductor pn junction with a wide band gap.
机译:提供一种p型掺杂Sb的导电SnO 2 薄膜,包含该薄膜的氧化锡均质pn结及其制备方法。一种制备p型掺杂Sb的SnO 2 薄膜的方法包括:使用掺杂Sb的SnO 2 陶瓷靶材料,并采用磁控溅射法在薄膜上进行制备。单晶硅或石英玻璃;通过溅射n型掺杂Sb的SnO 2 薄膜并在p型掺杂Sb的SnO 2 薄膜上沉积氧化锡均匀的pn结。 p型掺杂Sb的SnO 2 导电薄膜具有稳定的导电性能,高的空穴浓度,空穴迁移率和电导率,空穴浓度高达10 20 cm -3 ,电导率高达60S∙cm -1 ,同时空穴迁移率高达2-30cm 2 ∙V -1 ∙s -1 ,可见光透明度高。其制备方法工艺简单,重现性好,易于工业使用。所制备的均匀的基于氧化锡的透明pn结具有具有宽带隙的半导体pn结的电流-电压分布特性。

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