首页> 外国专利> CHALCOGENIDE-BASED MATERIALS AND METHODS OF MAKING SUCH MATERIALS UNDER VACUUM USING POST-CHALCOGENIZATION TECHNIQUES

CHALCOGENIDE-BASED MATERIALS AND METHODS OF MAKING SUCH MATERIALS UNDER VACUUM USING POST-CHALCOGENIZATION TECHNIQUES

机译:基于硫属化物的材料和使用后氯化生成技术在真空下制备此类材料的方法

摘要

The present invention provides strategies for making high quality CIGS photoabsorbing compositions on a substrate (18) from sputtered precursor film(s) (112). The precursors are converted into CIGS photoabsorbing material via a chalcogenizing treatment (also referred to as "post - chalcogenization", including, e.g., "post-selenization" when Se is used and/or "post-sulfurization" when S is used) using techniques that allow the post-chalcogenizing treatment to occur under atypically low pressure conditions. Consequently, the strategies of the invention are readily incorporated into batch processes or continuous processes such as roll-to-roll process occurring under vacuum. The present invention is useful at lab, pilot plant, and industrial scales. The precursor film (112) is capped by a second layer (114) such as elemental chalcogen using evaporation and then heat treated to form a chalcogenized layer (20).
机译:本发明提供了由溅射的前体膜(112)在基底(18)上制备高质量CIGS光吸收组合物的策略。通过使用硫属元素化处理(也称为“后硫属化”,包括例如使用Se时的“后硒化”和/或使用S时的“后硫化”)将前体转化为CIGS光吸收材料。可以在非典型的低压条件下进行硫属后处理的技术。因此,本发明的策略很容易并入间歇过程或连续过程中,例如在真空下进行的卷对卷过程。本发明可用于实验室,中试工厂和工业规模。前体膜(112)利用蒸发被第二层(114)例如元素硫属元素覆盖,然后热处理以形成硫属化层(20)。

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