GLASS SUBSTRATE HOLDING UNIT, AND A MANUFACTURING METHOD OF AN EXTREME ULTRAVIOLET RAY-BASED MASK BLANK USING THE SAME CAPABLE OF SUPPRESSING THE GENERATION OF SCRATCHES ON A GLASS SUBSTRATE

摘要

PURPOSE: A glass substrate holding unit, and a manufacturing method of an extreme ultraviolet ray(EUV)-based mask blank using the same are provided to prevent a glass substrate from deteriorating or misaligning.;CONSTITUTION: A glass substrate holding unit(100A) includes an electrostatic chuck unit and a holding member(114). The electrostatic chuck unit non-contactively absorbs the rear side of a glass substrate(200) using electrostatic absorption force. The holding member holds a part of the rear side of the glass substrate. The ratio of a region for the electrostatic absorption force of the electrostatic chuck unit and the area for a quality assurance region(210) on the rear side of the glass substrate is in a range between 0.5 and 1.0. The distance between the region for the electrostatic absorption force of the electrostatic chuck unit and the rear side of the glass substrate is more than 20um.;COPYRIGHT KIPO 2013