RETICLE ASSEMBLY, A LITHOGRAPHY APPARATUS, AND A METHOD FOR PROJECTING TWO OR MORE IMAGE FIELDS WITH A SINGLE SCANNING OPERATION OF A LITHOGRAPHY PROCESS CAPABLE OF IMPROVING THE EFFICIENCY OF SCANNING OPERATIONS IN THE LITHOGRAPHY APPARATUS

摘要

PURPOSE: A reticle assembly, a lithography apparatus, and a method for projecting two or more image fields with a single scanning operation of a lithography process are provided to project two or more image fields on a first target unit and a second target unit.;CONSTITUTION: A lighting system conditions a radiation beam(B). A mask table(MT) supports a patterning device(MA). A first position setting device(PM) accurately positions the patterning device according to preset parameters. A second position setting device(PW) accurately positions a substrate according to the preset parameters. A projection system(PS) projects a pattern given to the radiation beam on a target unit of the substrate.;COPYRIGHT KIPO 2013