OVERLAY VERNIER AND A METHOD FOR MEASURING OVERLAY ACCURACY BY USING THE SAME CAPABLE OF MEASURING A SIGNAL IN A CENTER REGION

摘要

PURPOSE: An overlay vernier and a method for measuring overlay accuracy by using the same are provided to accurately measure a signal by arranging a mother vernier and a daughter vernier in the same region.;CONSTITUTION: Mother vernier patterns(210) are separated from each other with a first distance on a substrate. The mother vernier patterns are bars or lattice shapes. Daughter vernier patterns(220) are arranged between the mother vernier patterns. The daughter vernier patterns are separated for each other with a second distance same as the first distance. The daughter vernier patterns have the same shapes as the mother vernier patterns.;COPYRIGHT KIPO 2013