APPARATUS AND A METHOD FOR DRYING A SUBSTRATE USING A SUPERCRITICAL FLUID

摘要

PURPOSE: An apparatus and a method for drying a substrate are provided to prevent a supercritical fluid from being directly supplied to a substrate by using a shielding plate, and the warpage of the substrate due to the pressure of the supercritical fluid.;CONSTITUTION: A process chamber(100) provides a space(101) for drying a substrate(W). A substrate support member(200) is arranged in a process chamber and supports the substrate. A first supply port(310) supplies a supercritical fluid to the lower part of the substrate. A second supply port(320) supplies the supercritical fluid to the upper part of the substrate. An exhaust port(330) discharges the supercritical fluid remaining in the process chamber to the outside. A shielding plate(340) is positioned in the lower part of the substrate support member.;COPYRIGHT KIPO 2013