APPARATUS FOR DEPOSITING SILICON CARBIDE AND A METHOD FOR DEPOSITING THE SILICON CARBIDE CAPABLE OF PREVENTING THE DEFECT OF A THIN FILM LAYER

摘要

PURPOSE: An apparatus for depositing silicon carbide and a method for depositing the silicon carbide are provided to prevent the contamination of a thin film by attaching a wafer to a susceptor in a vacuum process.;CONSTITUTION: A susceptor (30) is positioned in the upper part of a chamber (10). The susceptor includes one or more vacuum holes. The susceptor includes a vacuum line (70). The vacuum hole forms a vacuum. The vacuum line is connected to the vacuum hole.;COPYRIGHT KIPO 2013