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Hydrogenated amorphous silicon carbide thin films deposited by plasma-enhanced chemical vapor deposition

机译：通过等离子体增强的化学气相沉积沉积氢化非晶碳化硅薄膜

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Shiguo Yang; Guozhi Wen; Yang Luo; Yi Liang;
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1. Amorphous silicon carbide thin films (a-SiC:H) deposited by plasma-enhanced chemical vapor deposition as protective coatings for harsh environment applications [J] . W. Daves, A. Krauss, N. Behnel, Thin Solid Films . 2011,第18期

机译：通过等离子体增强化学气相沉积法沉积的非晶碳化硅薄膜（a-SiC：H）作为恶劣环境应用中的保护涂层
2. Post treatments of plasma-enhanced chemical vapor deposited hydrogenated amorphous silicon carbide for low dielectric constant films [J] . B. Lahlouh, T. Rajagopalan, N. Biswas, Thin Solid Films . 2006,第1a2期

机译：用于低介电常数薄膜的等离子增强化学气相沉积氢化非晶碳化硅的后处理
3. Deposition of Pure Hydrogenated Amorphous Silicon by Plasma-Enhanced Chemical Vapor Deposition for Polycrystalline Silicon Thin Film Transistors [J] . Masato Hiramatsu, Yoshinobu Kimura, Masayuki Jyumonji, Japanese Journal of Applied Physics. Part 1, Regular Papers & Short Notes . 2005,第6A期

机译：多晶硅薄膜晶体管的等离子增强化学气相沉积法沉积纯氢化非晶硅
4. Hydrogenated amorphous silicon carbide thin films deposited by plasma-enhanced chemical vapor deposition [C] . Shiguo Yang, Guozhi Wen, Yang Luo, International Conference on Sustainable Energy and Environmental Engineering . 2016

机译：通过等离子体增强的化学气相沉积沉积氢化非晶碳化硅薄膜
5. Plasma-enhanced chemical vapor deposition issues for amorphous silicon thin-film transistors for active-matrix liquid crystal displays [D] . Sherman, Steven Robert 1997

机译：用于有源矩阵液晶显示器的非晶硅薄膜晶体管的等离子体增强化学气相沉积问题
6. Transferless Inverted Graphene/Silicon Heterostructures Prepared by Plasma-Enhanced Chemical Vapor Deposition of Amorphous Silicon on CVD Graphene [O] . Martin Müller, Milan Bouša, Zdeňka Hájková, 2020

机译：CVD石墨烯上等离子增强化学气相沉积法制备的无转移反型石墨烯/硅异质结构
7. Simulation and Experimental Study of Photogeneration and Recombination in Amorphous-Like Silicon Thin Films Deposited by 27.12 MHz Plasma-Enhanced Chemical Vapor Deposition [O] . Chia-Hsun Hsu, In-Cha Hsieh, Chia-Chi Tsou, 2013

机译：27.12MHz等离子体增强化学气相沉积沉积的无定形硅薄膜中光生殖和重组的模拟与实验研究
8. Amorphous Carbon Films as Planarization Layers Deposited by Plasma-Enhanced Chemical Vapor Deposition. [R] . Pang, S. W., Horn, M. W. 1990

机译：通过等离子体增强化学气相沉积沉积的无定形碳膜作为平面化层。

Hydrogenated amorphous silicon carbide thin films deposited by plasma-enhanced chemical vapor deposition

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