SYSTEM, METHOD AND COMPUTER PROGRAM PRODUCT FOR COMPUTER AIDED DESIGN (CAD) BASED REGISTRATION GENERATING CORRECTION INFORMATION USED FOR WAFER INSPECTION

摘要

PURPOSE: System, method and computer program product for computer aided design (CAD) based registration are provided to generate commands for deforming a direction of electron beam used for scanning a run-time frame based on a run-time displacement of the previous frame.;CONSTITUTION: A displacement analysis module (210) calculates/determines a displacement with respect to targets selected in scanned frames included in a scanned region of a wafer. The calculation of displacement is based on an image related to targets obtained during the scan of the wafer and the correlation of design data corresponding to the image, and determination of the displacement is based on the calculated displacements with respect to targets in the scanned frame. A post-processing module (220) generates a target database including correction information including determined displacements with respect to the scanned frames, location information of database targets and target image.;COPYRIGHT KIPO 2013;[Reference numerals] (100) Wafer; (210) Displacement analysis module; (220) Post-processing module; (230) Sensor; (232) Movable stage; (234) Recipe database; (236) Line module; (238) Recipe interface; (240) Data storage unit; (250) Image processing module; (290) Processor; (295) Output interface; (AA) Images of targets; (BB) Displacement information; (CC) Scanned image data