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SHAPING OFFSET ADJUSTING METHOD USING A THIRD POLYNOMIAL AND A CHARGED PARTICLE BEAM WRITING APPARATUS
SHAPING OFFSET ADJUSTING METHOD USING A THIRD POLYNOMIAL AND A CHARGED PARTICLE BEAM WRITING APPARATUS
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机译:使用第三项多项式和带电粒子束写入设备的形状偏移调整方法
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摘要
PURPOSE: A shaping offset adjusting method and a charged particle writing apparatus are provided to reduce shaping offset adjusting errors by performing fitting using a third polynomial.;CONSTITUTION: A control unit (3) includes a deflection controller (32), a detector (36), and a control calculator (31). The deflection controller controls the deflection of a charged particle beam. The detector measures a current value of the charged particle beam and includes a Faraday cup. A control calculator controls the deflection controller and a stage.;COPYRIGHT KIPO 2013;[Reference numerals] (31a) Data processor; (31b) Setting unit; (31c) Calculation unit; (31d) Determination unit; (32) Deflection controller; (32a) Correction unit; (33) Blanking amplifier; (34,35) DAC amplifier; (36) Detector; (37) Memory; (39) External I/F
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