CHEMICAL VAPOR DEPOSITION DEVICE FOR A DIAMOND COMPOSITION AND A DIAMOND COMPOSITION METHOD USING THE SAME

摘要

PURPOSE: A chemical vapor deposition device for a diamond composition and a diamond composition method using the same are provided to suppress an increase on substrate temperature and to improve the extent of activation of a diamond composition gas or ion at the same time.;CONSTITUTION: A chemical vapor deposition device for a diamond composition includes a chamber in which a chemical vapor deposition process is progressed; a substrate formed inside the chamber and provides a space for the growth of a diamond; and a heat insulation structure formed at a position spaced from the top of the substrate. The heat insulation structure includes an opening in which a precursor gas can be moved. A filament of a high melting point is arranged on an upper space of the chamber. The heat insulation structure is arranged between the filament and the substrate.;COPYRIGHT KIPO 2013;[Reference numerals] (AA) High melting point filament; (BB) Substrate; (CC) Water-cooling block