INDUCTION HEATER, CHEMICAL VAPOR DEPOSITION APPARATUS COMPRISING THE SAME AND METHOD OF CONTROLLING TEMPERATURE DISTRIBUTION OF CHEMICAL VAPOR DEPOSITION APPARATUS COMPRISING INDUCTION HEATER

摘要

PURPOSE: An inductive heater, a chemical vapor deposition device comprising the same, and a method of controlling the temperature distribution of the deposition device are provided to prevent the temperature of the central part of a susceptor from rising or the temperature of the outer part of the susceptor from falling.;CONSTITUTION: An inductive heater comprises conductors(140A,141A,142A,143A,144A) and an inductive heating unit. The inductive heating unit inductively heats the conductors. The cross-sectional area of the conduct substantially decreases from one end to the other end. The conductors comprise a first unit conductor to a Nth unit conductor, which are continuously coupled. The cross-sectional area of an Mth unit conductor is substantially narrower than an M-1th unit conductor. The conductor is formed in a spiral shape and a part of the conductor, which has a narrow cross-sectional area, is located on another part, which has substantially a large spiral curvature.;COPYRIGHT KIPO 2012