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A PLATING APPARATUS AND A PLATING METHOD USING A PLATING APPARATUS

机译:镀敷装置及使用该镀敷装置的镀敷方法

摘要

PURPOSE: A plating device and a plating method using the same are provided to simplify a process and to reduce manufacturing costs by omitting a masking as a plated portion is opened and a plating device is closely adhered to an unplated portion. CONSTITUTION: A plating device comprises a metal electrode unit(10), a body unit(20), and a passage portion(30). The electrode unit is formed in a longitudinal direction. The body unit is formed in correspondence to an inner side wall of a cylinder cover. A plurality of supporters is formed in a portion where plating is not necessary so that the body unit is closely adhered to the inner side wall. The body unit is opened in a portion where plating is necessary. The passage portion passes through the body unit in a longitudinal direction. Recessed portions(24) are formed on the edges of the upper and lower ends of the supporters and formed into a step shape.
机译:目的:提供一种电镀装置和使用该电镀装置的电镀方法,以简化工艺并通过在打开电镀部分并且将电镀装置紧密粘附至未电镀部分时省略掩膜来降低制造成本。构成:一种电镀装置,包括金属电极单元(10),主体单元(20)和通道部分(30)。电极单元沿纵向形成。主体单元对应于缸盖的内侧壁形成。在不需要镀覆的部分中形成有多个支撑件,使得主体单元紧密地粘附至内侧壁。主体单元在需要电镀的部分中打开。通道部分在纵向方向上穿过主体单元。凹部(24)形成在支撑件的上端和下端的边缘上并且形成为台阶形状。

著录项

  • 公开/公告号KR101233732B1

    专利类型

  • 公开/公告日2013-02-22

    原文格式PDF

  • 申请/专利权人 SAMWOO METAL IND. CO. LTD.;

    申请/专利号KR20120075684

  • 发明设计人 BANG NAM SEOK;

    申请日2012-07-11

  • 分类号C25D5/02;

  • 国家 KR

  • 入库时间 2022-08-21 16:25:44

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