ANTIREFLECTIVE COATING COMPOSITION, ANTIREFLECTIVE COATING, AND PATTERNING PROCESS

摘要

The present invention is to have a repeating unit represented by the formula 1 and / or 2, in the exposure wavelength with the extinction coefficient (k value) of the polymer compound in a range of 0.01 to 0.4 (A), having an aromatic ring, extinction coefficient (k value) is in the range of 0.3 to 1.2 polymeric compound (B) according to the exposure wavelength provides an antireflection film-forming materials, including ; & . Formula 1 & ; Formula 2 ; (R ¹ is H, CH ₃ , F or CF ₃ and, R ² , R ³ is H or a monovalent hydrocarbon group, or R ² , R ³ is may form a ring by binding each other, R ⁴ is H or one represents a hydrocarbon, for a monovalent hydrocarbon group, -CH ₂ - -O-, or -C is (= O) - may be substituted with, R ⁵ to R ⁷ is H, OH, halogen or 1 The organic group, R ⁵ to R ⁷ is that at least two of which may form a ring by combining with each other in any combination) ; anti-reflection film forming material of the present invention are possible in the same film-forming process and the conventional organic anti-reflection film, and its anti-reflection film is to prevent the effective reflection in the lithographic exposure light.