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ion beam implantation appointed umbilicals local code required equipment connected

机译:离子束植入指定的脐带缆本地规范所需的设备已连接

摘要

ion beam implanter generating an ion beam moving along an ion beam source and the beam line, the ion workpiece by the beam includes a vacuum chamber or main entrance is arranged so as to intersect the ion beam for ion implantation of the surface of the workpiece. The ion beam implanter is coupled to the main entrance further comprising a workpiece 24. The workpiece support structure for supporting (100). The workpiece support structure includes a chuck (202) including a rotatable pedestal supporting the workpiece (24, 204). Workpiece support structure coupled to the pedestal is coupled to the rotatable with said first rotatable reel stand 262 and a first rotatable reel,, when the stand is to be rotated in the first direction, around the first reel increasing the length of the flexible cord wound on sex and, when the stand is to be rotated in the opposite direction, is that the length of the binary flexible cord wound around the first reel will return the equipment, such as water coolant lines and power conductors to reduce further includes a castle hollow cord.
机译:离子束注入机产生沿离子束源和束线移动的离子束,离子束通过离子工件包括真空室或主入口,以与离子束相交以进行离子注入工件的表面。离子束注入机耦合到主入口,主入口还包括工件24。用于支撑的工件支撑结构(100)。工件支撑结构包括卡盘(202),该卡盘(202)包括支撑工件(24、204)的可旋转基座。耦合到基座的工件支撑结构通过所述第一可旋转卷轴支架262和第一可旋转卷轴耦合到可旋转,当支架沿第一方向旋转时,绕第一卷轴增加柔性线绕的长度关于性,并且当支架要沿相反方向旋转时,是指缠绕在第一个卷轴上的二元柔性软线的长度将使设备返回,例如冷却水管线和电源线,以减少进一步包括城堡空心的空间线。

著录项

  • 公开/公告号KR1012677090000B1

    专利类型

  • 公开/公告日2013-05-23

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR1020067010284

  • 发明设计人 미첼 로버트;랸 케빈;

    申请日2004-12-03

  • 分类号H01L21/265;

  • 国家 KR

  • 入库时间 2022-08-21 16:25:09

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