Nanoscale lithography method on graphene using oxidation and hydrogenation

摘要

PURPOSE: A system for manufacturing the nano lithography of graphene using oxidization and hydrogenation and a method for the same are provided to omit chemical treatment and to use an atomic force microscope. CONSTITUTION: Oxidized patterns through an atomic force microscope-anodic lithography or hydrogenated patterns through an atomic force microscope-cathodic lithography are formed on graphene in order to form nano-sized oxidizing or hydrogenating process patterns on the graphene. In the atomic force microscope-anodic lithography, a tip and the graphene with a contact mode are fixed at 0.1um/s under room temperature and 20% relative humidity, and a voltage between the tip and the graphene is increased. In the atomic force microscope-cathodic lithography, the tip and the graphene with a contact mode are fixed at 0.1um/s under room temperature and 33% relative humidity, and a voltage between the tip and the graphene is increased.