WATER-SOLUBLE RESIN COMPOSITION CONTAINING POLYMER WITH AMINE SALT AND AMINE, AND METHOD OF FORMING FINE PATTERNS BY USING THE SAME

摘要

PURPOSE: A water-soluble resin composition containing polymer with amine salt and amine, and a method for forming fine patterns by using the same are provided to obtain a pattern with a desired small size by performing a thermal process after a photoresist layer is covered with the polymer with amine salt and amine. CONSTITUTION: A photoresist pattern layer is prepared. The photoresist pattern layer is covered with a water-soluble resin composition. A thermal process is performed on the photoresist pattern layer covered with a water-soluble resin composition. A coating film including a cross-linked region is formed. The coating film except the cross-linked region is removed by dissolving the coating film in a second water-soluble solvent.