首页> 外国专利> DESIGN AND TECHNOLOGY TO MANUFACTURE INTEGRAL MICROMECHANICAL RELAY WITH MOVABLE ELECTRODE AS STRUCTURE WITH PIEZOELECTRIC LAYER

DESIGN AND TECHNOLOGY TO MANUFACTURE INTEGRAL MICROMECHANICAL RELAY WITH MOVABLE ELECTRODE AS STRUCTURE WITH PIEZOELECTRIC LAYER

机译:压电层结构可动电极制造微机械继电器的设计与工艺

摘要

FIELD: electricity.SUBSTANCE: method to manufacture an integral micromechanical relay with a movable electrode in the form of a structure with a piezoelectric layer, comprising a substrate, coated with a dielectric layer with a lower (fixed) electrode and a movable electrode, consisting serially of a lower current-conductive layer, a dielectric layer with high elastic properties, a medium current-conductive layer, a piezoelectric layer, an upper current-conductive layer, arranged on the surface of the above substrate is realised on the surface of silicon plates. Development of an integral micromechanical relay with a movable electrode in the form of a structure with a piezoelectric layer is carried out in a single process cycle with simplified manufacturing technology compatible with technology of production of integrated circuits, in which formation of a movable electrode is possible in the form of a cantilever or in the form of a beam and includes the following operations: formation of a film SiNon the surface of the silicon substrate by the method of SiNpyrolysis; sputtering of a TiN layer and formation of a "lower electrode" structure by the method of projection photolithography and plasma-chemical etching of the TiN layer; deposition of a layer of PSG (phosphate-silicate glass) by the method of chemical deposition from a gas phase and formation of a sacrificial layer on its basis by the method of liquid chemical etching; sputtering of the first TiN layer; deposition of the dielectric layer SiN; sputtering of the second TiN layer; deposition of the piezoelectric layer of lead zirconate titanate (LZT); sputtering of the third TiN layer; plasma-chemical etching of the layers: the third TiN layer, the LZT layer, the second TiN layer, the SiNlayer, the first TiN layer with formation of a movable multilayer electrode and opening of the sacrificial layer of PSG, liquid chemical etching of the sacrificial PSG layer with formation of an air gap between a fixed and a movable electrodes.EFFECT: increased reliability and extended service life of a micromechanical relay, using microelectronic technology for production of a micromechanical relay makes it possible to minimise device dimensions down to 20-80 mcm and to simplify technology of its production.3 cl, 5 dwg
机译:具有压电层的结构形式的具有可动电极的整体式微机械继电器的制造方法,包括:基板,其上涂覆有具有下部(固定)电极和可动电极的介电层在硅的表面上依次实现下导电层,高弹性性能的介电层,中导电层,压电层,上导电层的顺序排列盘子。具有可动电极的具有压电层的结构形式的整体式微机械继电器的开发在单个处理周期中以简化的制造技术进行,该简化的制造技术与集成电路的制造技术兼容,其中可形成可动电极以悬臂的形式或以梁的形式,并且包括以下操作:通过SiN热解法在硅衬底的表面上形成膜SiN;通过投影光刻法和对TiN层的等离子体化学蚀刻的方法,溅射TiN层并形成“下部电极”结构;通过气相化学沉积法沉积PSG(磷酸盐-硅酸盐玻璃)层,并通过液相化学蚀刻法在其上形成牺牲层;溅射第一TiN层;沉积介电层SiN;溅射第二TiN层;沉积锆钛酸铅(LZT)的压电层;溅射第三TiN层;等离子体化学刻蚀各层:第三TiN层,LZT层,第二TiN层,SiN层,第一TiN层,形成可移动的多层电极并打开PSG牺牲层,牺牲PSG层,在固定电极和可移动​​电极之间形成气隙。效果:使用微电子技术生产微机械继电器,提高了微机械继电器的可靠性并延长了其使用寿命,可以将器件尺寸最小化至20- 80 mcm并简化生产工艺。3 cl,5 dwg

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