Grid with a high aspect ratio, in particular for use as x-ray optical gratings in a ct - system produced by a lithography method

摘要

Grid with a high aspect ratio, in particular for use as x-ray optical gratings in a ct - system produced by a lithography method, comprising:– a plurality of periodically alternating solid portions (1) and the grid columns (2) with a height (h), and– a plurality of the grid columns (2) in each case with a distance (l) which are arranged opposite one another in the column direction of the filling beam (4), the respectively adjacent solid portions (1) over its height (h),– the solid portions (1) and the grid columns (2) of a first to a second side of the grating, and run– a beam (4) a width (f) in the column direction, and this width (f) a maximum of 10% of the distance (1) of two adjacent filling beam (4) is in the column direction,characterized in that– the spacings (l) in each case in the column direction in a whose lattice spacing (2) of adjacent filling beam (4) in the entire grating in order to not more than 10% vary.