A method for the impedance matching of the output impedance of a high frequency power supply arrangement on the impedance of a plasma load and high frequency power supply arrangement

摘要

A process for the impedance matching of the output impedance of a high frequency power supply arrangement (1) to the impedance of a plasma load (2) comprises the process steps:a. generating a high-frequency signal by means of a high frequency signal generator (6);example, in a first impedance adaptation mode impedance matching of the output impedance of the high frequency power supply arrangement (1) exclusively by changing the frequency of the generated high-frequency signal;c. monitoring the frequency of the generated high-frequency signal as to whether they are in a predetermined frequency range;c. if the frequency is outside of the predetermined frequency range is located, in a second impedance adaptation mode impedance matching of the output impedance of the high frequency power supply arrangement (1) by mechanical and / or electrical change of a the high frequency signal generator (6) downstream circuit (11).