首页> 外国专利> Micromechanical sensor for, e.g. analyzing topographies in grid force microscopy, has unilateral bendable cantilever in which gate electrode of FET is inserted, and is spaced at free space from semiconductor substrate

Micromechanical sensor for, e.g. analyzing topographies in grid force microscopy, has unilateral bendable cantilever in which gate electrode of FET is inserted, and is spaced at free space from semiconductor substrate

机译:微型机械传感器,例如在栅格力显微镜下分析形貌,具有单侧可弯曲的悬臂,其中插入了FET的栅电极,并且与半导体衬底保持自由空间

摘要

The micromechanical sensor (1) has a unilateral bendable cantilever (2) in which a gate electrode (3) of a FET is inserted, and is spaced at a free space (7) from a semiconductor substrate (4) corresponding to drain and source regions (5,6) of the FET. The distance of cantilever to semiconductor substrate is changed by bending of the cantilever. The distance between source and drain regions, and distance of cantilever to semiconductor substrate in bent condition and channel layer thickness are selected, such that the short channel effects of FET are achieved. An independent claim is included for a method for producing micromechanical sensor.
机译:微机械传感器(1)具有其中插入有FET的栅电极(3)的单侧可弯曲悬臂(2),并且与对应于漏极和源极的半导体衬底(4)以自由空间(7)间隔开。 FET的区域(5,6)。悬臂到半导体衬底的距离通过悬臂的弯曲而改变。选择源极和漏极区域之间的距离,以及在弯曲条件下的悬臂至半导体衬底的距离和沟道层厚度,从而获得FET的短沟道效应。包括用于制造微机械传感器的方法的独立权利要求。

著录项

  • 公开/公告号DE102011107649A1

    专利类型

  • 公开/公告日2013-01-17

    原文格式PDF

  • 申请/专利号DE201110107649

  • 发明设计人 KNOCH JOACHIM;MEIJER JAN;

    申请日2011-07-12

  • 分类号B81B7/02;B81B3;G01Q70;G01Q60/24;B81C1;H01L21/335;H01L29/772;G01N33;G01B7/14;G01D5;

  • 国家 DE

  • 入库时间 2022-08-21 16:22:12

相似文献

  • 专利
  • 外文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号