首页> 外国专利> Semiconductor detector for detecting radiation, has intermediate memory disconnected from internal gate, where radiation-generated charge carrier signal buffers before charge carrier signals are transferred for reading in gate of structures

Semiconductor detector for detecting radiation, has intermediate memory disconnected from internal gate, where radiation-generated charge carrier signal buffers before charge carrier signals are transferred for reading in gate of structures

机译:用于检测辐射的半导体检测器具有与内部栅极断开的中间存储器,在该内部存储器中,在传输电荷载流子信号以读取结构的栅极之前,辐射产生的电荷载流子信号缓冲器

摘要

The detector has a depleted p-channel field effect transistor (DEPFET) structure comprising a controllable duct and an internal gate. The internal gate is buried in a semiconductor substrate below the duct to receive charge carrier signals such that the duct controls the accumulated charge carrier signals in the internal gate. An intermediate memory (PM) is disconnected from the internal gate, where the radiation-generated charge carrier signal buffers before the radiation-generated charge carrier signals are transferred for reading in the gate of the structures. The DEPFET structure is one metal oxide semiconductor (MOS) structure, junction field effect transistor (JFET) structure or repetitive non-destructive readout (RNDR) structure. The intermediate memory is vertical p-n-p-structure or MOS structure. An independent claim is also included for a method for operating a semiconductor detector.
机译:该检测器具有耗尽的p沟道场效应晶体管(DEPFET)结构,该结构包括可控导管和内部栅极。内部栅极掩埋在管道下方的半导体衬底中,以接收电荷载流子信号,从而使管道控制内部栅极中累积的电荷载流子信号。中间存储器(PM)与内部栅极断开连接,内部辐射产生的电荷载流子信号在传输辐射产生的载流子信号以读取结构的栅极之前进行缓冲。 DEPFET结构是一种金属氧化物半导体(MOS)结构,结型场效应晶体管(JFET)结构或重复性非破坏性读出(RNDR)结构。中间存储器是垂直p-n-p结构或MOS结构。还包括用于操作半导体检测器的方法的独立权利要求。

著录项

  • 公开/公告号DE102011115656A1

    专利类型

  • 公开/公告日2013-03-28

    原文格式PDF

  • 申请/专利权人 PNSENSOR GMBH;

    申请/专利号DE201110115656

  • 发明设计人 LUTZ GERHARD;

    申请日2011-09-28

  • 分类号H01L31/115;H01L27/146;

  • 国家 DE

  • 入库时间 2022-08-21 16:22:10

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