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Micromechanical structure for rotational rate sensor, has substrate and movable mass that is movably mounted opposite to substrate by spring element, where substrate is provided with main extension plane
Micromechanical structure for rotational rate sensor, has substrate and movable mass that is movably mounted opposite to substrate by spring element, where substrate is provided with main extension plane
The micromechanical structure (1) has a substrate (2) and a movable mass (3) that is movably mounted opposite to the substrate by a spring element (10), where the substrate is provided with a main extension plane (100). The spring element is engaged in a fastening area (12) on the movable mass. An electrode (5) is arranged such that a distance (50) between center of gravity (104) and a portion of an overlapping area (6) is equal to another distance (51) between the center of gravity and the fastening area parallel to the main extension plane. An independent claim is included for a rotational rate sensor with a coriolis element.
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