Optical system for wafer inspection system, has polarization manipulator enabling variation of polarization state of partial beam independent of another partial beam, and beam-deflecting element provided in optical path of partial beams

摘要

The system (100) has a polarization manipulator (130) for variation of a polarization state of a partial beam (S101). Another polarization manipulator enables variation of a polarization state of another partial beam (S102) that is independent of the former partial beam. A beam-deflecting element (120) is provided in an optical path of the partial beams. Wedge elements (131, 132, 141, 142) are partially made of optically active crystal material i.e. crystalline quartz. The polarization manipulators are designed as pockels cells i.e. transverse pockels cells. An independent claim is also included for a method for operating a wafer inspection system.