首页> 外国专利> Facet mirror e.g. field facet mirror, for channel-wise reflection of light radiation in UV micro-lithographic projection exposure system, has displaceable micro mirrors whose facet reflecting surfaces exhibit specific area

Facet mirror e.g. field facet mirror, for channel-wise reflection of light radiation in UV micro-lithographic projection exposure system, has displaceable micro mirrors whose facet reflecting surfaces exhibit specific area

机译:小平面镜例如场分面镜,用于在紫外线微光刻投影曝光系统中对光辐射进行通道反射,具有可移动的微镜,其分面反射面显示特定的面积

摘要

The mirror e.g. field facet mirror (19), has a set of simple facets (38e) and a set of composite facets (38z) comprising two sets of facet reflecting surfaces, respectively. The facet reflecting surfaces of the composite facets are assembled to a set of single reflecting surfaces of displaceable micro mirrors (28). Facet reflecting surfaces of the simple facets and the single reflecting surfaces of the displaceable micro mirrors exhibit areas of about 10 and 5 square mm, respectively, where number of simple facets lies within a range of 20-1000. Independent claims are also included for the following: (1) a lighting system (2) a method for lighting an object field (3) an optical system (4) a method for manufacturing a micro or nano-structured component.
机译:镜子例如视场小面镜(19)具有一组简单小面(38e)和一组复合小面(38z),分别包括两组小面反射面。复合小平面的小平面反射表面被组装到可移位微镜(28)的一组单反射表面上。简单刻面的刻面反射表面和可移动微镜的单个反射面分别显示大约10平方毫米和5平方毫米的面积,其中简单刻面的数量在20-1000的范围内。还包括以下方面的独立权利要求:(1)照明系统(2)照明物场的方法(3)光学系统(4)制造微米或纳米结构部件的方法。

著录项

  • 公开/公告号DE102012207511A1

    专利类型

  • 公开/公告日2013-05-08

    原文格式PDF

  • 申请/专利权人 CARL ZEISS SMT GMBH;

    申请/专利号DE201210207511

  • 发明设计人 PATRA MICHAEL;EISENMENGER JOHANNES;

    申请日2012-05-07

  • 分类号G02B26/08;G02B5/09;G03F7/20;

  • 国家 DE

  • 入库时间 2022-08-21 16:21:43

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