REFERENCE IMAGE CREATION METHOD OF SUBSTRATE, DEFECT INSPECTION METHOD OF SUBSTRATE, REFERENCE IMAGE CREATION DEVICE OF SUBSTRATE, DEFECT INSPECTION UNIT OF SUBSTRATE, PROGRAM AND COMPUTER STORAGE MEDIUM

摘要

PROBLEM TO BE SOLVED: To create an appropriate reference image of a substrate to properly perform defect inspection of the substrate.SOLUTION: A method for picking up images of a wafer and creating an image of the wafer which becomes a reference of defect inspection on the basis of the plurality of picked-up substrate images has: a component decomposition process of decomposing a planar distribution Z of pixel values in the picked-up substrate images into a plurality of pixel value distribution components, respectively, by using Zernike polynomials for every substrate image; a Zernike coefficient calculation process of calculating Zernike coefficients of the respective pixel value distribution components decomposed with the Zernike polynomials, respectively; a Zernike coefficient extraction process of extracting (1) center values and (2) values deviated from the center values by a predetermined value or more for every Zernike coefficient having the same degree, respectively from the respective calculated Zernike coefficients; an image specification process of specifying the respective substrate images having the extracted values; and an image creation process of creating the image of the wafer which becomes the reference of the defect inspection by synthesizing the respective specified substrate images with one another.