首页> 外国专利> HEATING ELEMENT COMPENSATION ARRAY STRUCTURE FOR VACUUM HEAT TREATMENT FURNACE

HEATING ELEMENT COMPENSATION ARRAY STRUCTURE FOR VACUUM HEAT TREATMENT FURNACE

机译:真空热处理炉的加热元件补偿阵列结构

摘要

PROBLEM TO BE SOLVED: To provide a vacuum heat treatment furnace adjusting uniform heating of a treatment object in a vacuum furnace.;SOLUTION: There is provided a heating element array structure for a vacuum heat treatment furnace in which heating elements constructing a heating element array have different electric resistances or different watt densities at different positions in the heating element array. In this array structure, in order to provide a more excellent temperature uniformity in one processing amount of the treatment object, heating elements having an electric resistance selected so as to provide heat required at a hot zone in a furnace are arrayed. The electric resistance and watt density of the heating element array are changed with the use of a first heating element comprising a certain geometry in one segment of the heating element array and a second heating element comprising a different geometry from the geometry of the first heating element in another segment in the heating element array.;COPYRIGHT: (C)2014,JPO&INPIT
机译:解决的问题:提供一种真空热处理炉,其调节真空炉中处理对象的均匀加热。;解决方案:提供了一种用于真空热处理炉的加热元件阵列结构,其中,加热元件构成加热元件阵列。在加热元件阵列中的不同位置具有不同的电阻或不同的功率密度。在该阵列结构中,为了在处理对象的一个​​处理量中提供更优异的温度均匀性,对具有加热电阻的加热元件进行选择,以提供在炉中的热区所需的热量。通过使用在加热元件阵列的一个区段中包括一定几何形状的第一加热元件和在第二加热元件中具有与第一加热元件的几何形状不同的几何形状的第二加热元件来改变加热元件阵列的电阻和瓦特密度。版权:(C)2014,JPO&INPIT

著录项

  • 公开/公告号JP2014122733A

    专利类型

  • 公开/公告日2014-07-03

    原文格式PDF

  • 申请/专利权人 IPSEN INC;

    申请/专利号JP20120278316

  • 申请日2012-12-20

  • 分类号F27D11/02;C21D1/773;H05B3/10;

  • 国家 JP

  • 入库时间 2022-08-21 16:19:36

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