THERMOSETTING RESIN COMPOSITION FOR FORMING CURED FILM, RADIATION-SENSITIVE RESIN COMPOSITION FOR FORMING CURED FILM, CURED FILM, METHOD FOR FORMING THE SAME, SEMICONDUCTOR ELEMENT, AND DISPLAY ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide a resin composition for forming a cured film, which can form a cured film having excellent surface hardness and capable of fully satisfying general characteristics such as chemical resistance, heat resistance, transmittance, and dielectric constant and is excellent in storage stability.;SOLUTION: The present invention is the thermosetting resin composition for forming a cured film, which contains [A] a polymer containing: a structural unit (I) containing at least one selected from the group consisting of a group represented by formula (1) and a group represented by formula (2); and a structural unit (II-1) containing a crosslinkable group (a1). In the formula (1), R¹ and R² are each a hydrogen atom, a C1-C4 alkyl group, or a C1-C4 fluorinated alkyl group. In the formula (2), R³ and R⁴ are each a hydrogen atom, a halogen atom, a C1-C4 alkyl group, or a C1-C4 fluorinated alkyl group. Preferably, the crosslinkable group (a1) is at least one selected from the group consisting of an oxiranyl group and an oxetanyl group.;COPYRIGHT: (C)2014,JPO&INPIT