CHARGED PARTICLE BEAM DRAWING APPARATUS, AND CHARGED PARTICLE BEAM DRAWING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a drawing apparatus for performing high-accuracy correction on a deformation amount of mirror curving.;SOLUTION: A drawing apparatus 100 comprises: an XY stage 105, for placing a specimen thereon, in which a reflection mirror for X-direction position measurement and a reflection mirror for Y-direction measurement are disposed; a laser interferometer 10 for X-direction measurement; a laser interferometer 14 for Y-direction position measurement; a storage device 142 for storing data of a correlation between a Y-direction position and a curving deformation amount of the mirrors in an X direction; a correction circuit 130 for correcting the curving deformation amount of the reflection mirror 30 in the X direction corresponding to a position of the reflection mirror 30 in a Y direction irradiated with a laser with respect to a position of the stage measured by the laser interferometer 10; and a drawing section 150 for drawing a predetermined pattern by deflecting a charged particle beam by a deflection amount which is obtained on the basis of the corrected stage position, with respect to such a drawing position that the position in the Y direction is different from the position of the reflection mirror 30 in the Y direction irradiated with the laser beam.;COPYRIGHT: (C)2014,JPO&INPIT