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MASK ALIGNMENT DEVICE, MASK ALIGNMENT METHOD, FILM PRODUCTION DEVICE AND FILM PRODUCTION METHOD

机译:掩模对准装置,掩模对准方法,膜生产装置和膜生产方法

摘要

PROBLEM TO BE SOLVED: To provide a mask alignment device or the like capable of easily adjusting an exposure position at high accuracy.;SOLUTION: A mask alignment device 100 comprises: an imaging device 14 including a first imaging part 7 and a second imaging part 8; a rail 13 of moving the imaging device 14; a controller 10; an image treatment apparatus 51; a monitor 52; and a position regulation apparatus 53. The image treatment apparatus 51 calculates a difference between the tilt angle of a mask pattern 3a in the image of the mask 3 taken by the first imaging part 7 in the imaging device 14 and the tilt angle of the mask pattern 3a in the image of the mask 3 taken by the second imaging part 8. Further, after the imaging device 14 is moved along the rail 13, it calculates a difference between the tilt angle of a scribe line 6 in the image of a roll 2a taken by the first imaging part 7 in the imaging device 14 and the tilt angle of the mask pattern 3a in the image of the mask 3 taken by the second imaging part 8.;COPYRIGHT: (C)2014,JPO&INPIT
机译:解决的问题:提供一种能够容易地以高精度容易地调整曝光位置的掩模对准装置等;解决方案:掩模对准装置100包括:成像装置14,其包括第一成像部分7和第二成像部分。 8;移动成像装置14的轨道13;控制器10;图像处理装置51;监视器52;图像处理装置51计算由成像装置14中的第一成像部件7拍摄的掩模3的图像中的掩模图案3a的倾斜角与掩模的倾斜角之间的差。由第二成像部分8拍摄的掩模3的图像中的图案3a。此外,在沿着轨道13移动成像装置14之后,其计算辊图像中的划线6的倾斜角之间的差。成像装置14中的第一成像部分7所拍摄的图2a和第二成像部分8所拍摄的掩模3的图像中的掩模图案3a的倾斜角;版权:(C)2014,JPO&INPIT

著录项

  • 公开/公告号JP2014010270A

    专利类型

  • 公开/公告日2014-01-20

    原文格式PDF

  • 申请/专利权人 DAINIPPON PRINTING CO LTD;

    申请/专利号JP20120146492

  • 发明设计人 AYUSAWA TSUKASA;KUROSE MASAHIRO;

    申请日2012-06-29

  • 分类号G03F9/00;G03F7/20;G02F1/13363;G02B5/30;

  • 国家 JP

  • 入库时间 2022-08-21 16:18:05

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