首页> 外国专利> MICROMIRROR ARRAY, MICROMIRROR ARRAY MANUFACTURING METHOD AND OPTICAL ELEMENT FOR USE IN MICROMIRROR ARRAY

MICROMIRROR ARRAY, MICROMIRROR ARRAY MANUFACTURING METHOD AND OPTICAL ELEMENT FOR USE IN MICROMIRROR ARRAY

机译:微镜阵列,微镜阵列的制造方法和用于微镜阵列的光学元件

摘要

PROBLEM TO BE SOLVED: To provide a micromirror array and an optical element for use in the micromirror array that can form a bright and high-luminance image, and to provide a micromirror array manufacturing method that can manufacture an array in an inexpensive cost without undergoing processes of a form release and a form removal.SOLUTION: A micromirror array manufacturing method according to the present invention is configured to include: a step of preparing a transparent tabular substrate; a step of mounting the substrate at a predetermined position on a processing stage of a dicing processing machine; a step of sequentially forming a plurality of lines of linear grooves in parallel with each other at a predetermined interval by use of a rotary cutter on one surface of respective substrates; overlapping the substrate having the linear groove formed on the one surface (front surface) by any of (D) overlapping a front surface of one substrate with a rear surface of the other substrate, (E) overlapping the front surface in each substrate with each other face-to-face and (F) overlapping the rear surface in each substrate with each other face-to-face; and making extension directions of the linear grooves 1g and 1'g in respective substrates 1 and 1' orthogonal to each other in a plane view.
机译:解决的问题:提供一种微镜阵列和用于该微镜阵列的光学元件,其可以形成明亮且高亮度的图像,并且提供一种可以以廉价的成本制造阵列而无需经历的微镜阵列制造方法。解决方案:根据本发明的微镜阵列制造方法被配置为包括:准备透明板状基板的步骤;以及制造透明板状基板的步骤。在切割加工机的加工台上将基板安装在预定位置的步骤;通过在各个基板的一个表面上利用旋转切割机以预定间隔彼此平行地形成多条线性凹槽线的步骤; (D)使一个基板的表面与另一基板的背面重叠,通过使(D)中的任一个与每个基板的表面重叠,使(D)中的任一个与在一个表面(前表面)上形成有线性凹槽的基板重叠。 (F)使每个基板的背面相互面对面;在平面图中,使各个基板1和1'中的线性槽1g和1'g的延伸方向彼此正交。

著录项

  • 公开/公告号JP2014032394A

    专利类型

  • 公开/公告日2014-02-20

    原文格式PDF

  • 申请/专利权人 NITTO DENKO CORP;

    申请/专利号JP20130134994

  • 发明设计人 JUNI NORIYUKI;

    申请日2013-06-27

  • 分类号G02B27/22;G02B5/08;B81B1;B81C3;

  • 国家 JP

  • 入库时间 2022-08-21 16:17:26

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号