Light curable composition for antireflection film of solid-state imaging device, antireflection film for solid-state imaging device using the same, manufacturing method of antireflection film for solid-state imaging element, and solid-state imaging element

摘要

PPROBLEM TO BE SOLVED: To provide an antireflection film which has satisfactory linearity of film edge and is excellent in weather resistance, to provide an antireflection film which has not such concerns that a pattern enters pixel regions of a color filter and has reduced time-deterioration of antireflection effect especially when being applied for solid-state image sensor, and to provide a solid-state image sensor which reduces the occurrence of a false signal due to stray light and has no color defect by using the antireflection film. PSOLUTION: A composition for antireflection film is prepared by dispersing a black coloring agent of average primary particle size of 30 nm in resin component. The antireflection film for solid-state image sensor is formed by using the composition for antireflection film. The solid-state image sensor has the antireflection film. PCOPYRIGHT: (C)2006,JPO&NCIPI