CHLORINE DIOXIDE INCLUSION COMPOSITION, CHLORINE DIOXIDE INCLUSION SHEET, CHLORINE DIOXIDE INCLUSION MASK, AND PROCESSING METHOD OF HARMFUL MATTER

摘要

PROBLEM TO BE SOLVED: To provide a chlorine dioxide inclusion composition, a chlorine dioxide inclusion sheet and a chlorine dioxide inclusion mask, that are suitably used for processing of an allergy-inducing substance such as pollen, indoor dust, skin waste, fungus and the like, and a harmful matter such as virus, pathogen and the like, and to provide a processing method of the harmful matter using them.;SOLUTION: A chlorine dioxide inclusion composition includes: chlorine dioxide; a chlorite; an aliphatic compound having two or more hydroxy groups; and moisture dissolving them. A chlorine dioxide inclusion sheet is formed by that the chlorine dioxide inclusion composition is supported by a breathable sheet. A processing method of a harmful matter comprises making the harmful matter contact to the chlorine dioxide inclusion composition, the chlorine dioxide inclusion sheet or the chlorine dioxide inclusion mask.;COPYRIGHT: (C)2014,JPO&INPIT