METHOD OF REMOVING FOREIGN MATTERS IN CHARGED PARTICLE BEAM DEVICE, AND CHARGED PARTICLE BEAM DEVICE

摘要

PROBLEM TO BE SOLVED: To solve a problem that, although foreign matter management for a semiconductor device of the latest technology whose allowable value of foreign matters becomes more strict, becomes more strict, there is no method for positively collecting foreign matters in a sample chamber without releasing the sample chamber to the air, and collecting with high efficiency the collected foreign matters to a dedicated table that can be applied with a voltage.;SOLUTION: In a method of removing foreign matters in a charged particle beam device, a magnetic field equal to or more than that applied at a normal use is applied to an objective lens, and an electric field equal to or more than that applied at a normal use is applied to an electrode arranged to a periphery of the objective lens, and thereby, foreign matters in a sample chamber are made to be adhered to the objective lens and the electrode arranged to the periphery of the objective lens or to be attracted to the periphery. A stage is moved so that the center of an optical axis is immediately above a dedicated table that can be applied with a voltage, and after the magnetic field of the objective lens is turned off, a potential difference between the electrode arranged to the periphery of the objective lens and the electrode arranged to a periphery of the stage is maximized and minimized periodically, and thereby, the foreign matters are forcibly made to be dropped on the dedicated table that can be applied with a voltage.;COPYRIGHT: (C)2014,JPO&INPIT