Method for measuring process parameters of a semiconductor fabrication process using the optical metrology

摘要

PROBLEM TO BE SOLVED: To provide a method of measuring a process parameter of a semiconductor fabrication process using an optical measurement.;SOLUTION: The fabrication process is performed on a first area using a first value of the process parameter. The fabrication process is next performed on a second area using a second value of the process parameter. Second measurements of the first and the second area are performed using an optical measuring device. One or more optical characteristics of the first area are determined based on the first measurement. One or more optical characteristics of the second area are determined based on the second measurement. The fabrication process is performed on a third area. A third measurement of the third area is performed using the optical measuring device. A third value of the process parameter is determined on the basis of the third measurement and a relation between the determined optical characteristics of the first area and the determined optical characteristics of the second area.;COPYRIGHT: (C)2008,JPO&INPIT