首页>
外国专利>
Lithographic apparatus and device manufacturing method using the 2D run-length encoding the image data compression
Lithographic apparatus and device manufacturing method using the 2D run-length encoding the image data compression
展开▼
机译:使用二维游程长度对图像数据进行压缩编码的光刻设备和装置制造方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
PROBLEM TO BE SOLVED: To provide a lithographic apparatus comprising an array of individually controllable elements and a data processing pipeline.;SOLUTION: The array of individually controllable elements modulates a beam of radiation. The data processing pipeline converts a first representation of a requested dose pattern to a sequence of control data suitable for controlling the array of individually controllable elements in order substantially to form the requested dose pattern on a substrate. The data processing pipeline comprises an offline pre-processing device and an online rasterizer. The offline pre-processing device converts the first representation of the requested dose pattern to an intermediate representation, which can be rasterized in a fewer number of operations than the first representation.;COPYRIGHT: (C)2012,JPO&INPIT
展开▼